Principles of plasma discharges and materials processing / Michael A. Lieberman (2005) / 978-0-471-72001-0

Public ISBD Titre : Principles of plasma discharges and materials processing Type de document : texte imprimé Auteurs : Michael A. Lieberman, Auteur ; Allanj. Lichtenberg, Auteur Mention d'édition : 2nd edition Editeur : New York : Wiley -Interscience Année de publication : 2005 Importance : XXXV-757 p. Présentation : couv. ill. en coul. Format : 25 cm ISBN/ISSN/EAN : 978-0-471-72001-0 Langues : Anglais (eng) Tags : Plasma physics  Plasma discharges  Materials processing  Plasma chemistry  RF discharges  DC sheaths  Langmuir probes  Pulsed power  Ionized physical vapor deposition  Dusty plasmas  Kinetic theory. Index. décimale : 533.9 Résumé : This extensively updated second edition of Principles of Plasma Discharges and Materials Processing offers a comprehensive exploration of both fundamental plasma physics and its applications in industrial plasma processing. The authors delve into the basics of plasma physics and chemistry, providing theoretical frameworks for understanding plasma discharges. Key topics include calculations of plasma parameters and the scaling of these parameters with control variables.​ Note de contenu : The second edition introduces new and expanded content on:​ Updated cross sections Diffusion and diffusion solutions Generalized Bohm criteria Expanded treatment of DC sheaths Langmuir probes in time-varying fields Electronegative discharges Pulsed power discharges Dual frequency discharges High-density RF sheaths and ion energy distributions Hysteresis and instabilities Helicon discharges Hollow cathode discharges Ionized physical vapor deposition Differential substrate charging​ Principles of plasma discharges and materials processing [texte imprimé] / Michael A. Lieberman, Auteur ; Allanj. Lichtenberg, Auteur  . -  2nd edition . - New York : Wiley -Interscience, 2005 . - XXXV-757 p. : couv. ill. en coul. ; 25 cm. ISBN : 978-0-471-72001-0 Langues : Anglais (eng) Tags : Plasma physics  Plasma discharges  Materials processing  Plasma chemistry  RF discharges  DC sheaths  Langmuir probes  Pulsed power  Ionized physical vapor deposition  Dusty plasmas  Kinetic theory. Index. décimale : 533.9 Résumé : This extensively updated second edition of Principles of Plasma Discharges and Materials Processing offers a comprehensive exploration of both fundamental plasma physics and its applications in industrial plasma processing. The authors delve into the basics of plasma physics and chemistry, providing theoretical frameworks for understanding plasma discharges. Key topics include calculations of plasma parameters and the scaling of these parameters with control variables.​ Note de contenu : The second edition introduces new and expanded content on:​ Updated cross sections Diffusion and diffusion solutions Generalized Bohm criteria Expanded treatment of DC sheaths Langmuir probes in time-varying fields Electronegative discharges Pulsed power discharges Dual frequency discharges High-density RF sheaths and ion energy distributions Hysteresis and instabilities Helicon discharges Hollow cathode discharges Ionized physical vapor deposition Differential substrate charging​

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